H1B Report
Side-by-side comparison

Microsoft Corporation vs NEO TECH SOLUTIONS INC.

A direct H-1B sponsorship comparison built from the same DOL Labor Condition Application data that drives every page on H1B Report. Total filings, outcome rates, top occupations and yearly demand side-by-side.

Entity A
Microsoft Corporation
WARank #5FEIN 91-1144442
Entity B
NEO TECH SOLUTIONS INC.
NJRank #FEIN 22-3449058

Key metrics

All percentages are share of total LCAs filed by each sponsor.

MetricMicrosoft CorporationNEO TECH SOLUTIONS INC.
Total filings72,912853
Certified %94.30%92.73%
Denied %0.15%1.29%
Withdrawn %0.69%3.87%
Cert-withdrawn %4.85%2.11%
Rank#5
Active yearsFY2010–FY2026FY2010–FY2026
Worksite stateWANJ

Outcomes — Microsoft Corporation

DOL case-status mix.

Outcome breakdown: Certified 94.3%, Cert-withdrawn 4.9%, Withdrawn 0.7%, Denied 0.2%
Outcome breakdown
OutcomeShare
Certified94.3%
Cert-withdrawn4.9%
Withdrawn0.7%
Denied0.2%
Certified94.3%
Cert-withdrawn4.9%
Withdrawn0.7%
Denied0.2%

Outcomes — NEO TECH SOLUTIONS INC.

DOL case-status mix.

Outcome breakdown: Certified 92.7%, Cert-withdrawn 2.1%, Withdrawn 3.9%, Denied 1.3%
Outcome breakdown
OutcomeShare
Certified92.7%
Cert-withdrawn2.1%
Withdrawn3.9%
Denied1.3%
Certified92.7%
Cert-withdrawn2.1%
Withdrawn3.9%
Denied1.3%

Yearly filing volume

Year-over-year H-1B demand for each sponsor.

Microsoft Corporation
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY20104,407
FY20114,184
FY20124,005
FY20133,832
FY20143,674
FY20154,476
FY20164,919
FY20174,884
FY20185,457
FY20196,000
FY202051
FY2021110
FY2022150
FY20232,791
FY20249,492
FY20259,362
FY20265,118
NEO TECH SOLUTIONS INC.
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY201026
FY201128
FY201242
FY201340
FY2014106
FY2015181
FY2016101
FY201767
FY2018113
FY201947
FY20201
FY20210
FY20220
FY20237
FY202451
FY202524
FY202619

Top 5 occupations — Microsoft Corporation

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Replace either sponsor above without losing the comparison. 2-way for now; 3+ comparison coming soon.