H1B Report
Side-by-side comparison

ALTAIR ENGINEERING, INC. vs Microsoft Corporation

A direct H-1B sponsorship comparison built from the same DOL Labor Condition Application data that drives every page on H1B Report. Total filings, outcome rates, top occupations and yearly demand side-by-side.

Entity A
ALTAIR ENGINEERING, INC.
MIRank #FEIN 38-2591828
Entity B
Microsoft Corporation
WARank #5FEIN 91-1144442

Key metrics

All percentages are share of total LCAs filed by each sponsor.

MetricALTAIR ENGINEERING, INC.Microsoft Corporation
Total filings48772,912
Certified %90.76%94.30%
Denied %0.62%0.15%
Withdrawn %5.75%0.69%
Cert-withdrawn %2.87%4.85%
Rank#5
Active yearsFY2010–FY2026FY2010–FY2026
Worksite stateMIWA

Outcomes — ALTAIR ENGINEERING, INC.

DOL case-status mix.

Outcome breakdown: Certified 90.8%, Cert-withdrawn 2.9%, Withdrawn 5.7%, Denied 0.6%
Outcome breakdown
OutcomeShare
Certified90.8%
Cert-withdrawn2.9%
Withdrawn5.7%
Denied0.6%
Certified90.8%
Cert-withdrawn2.9%
Withdrawn5.7%
Denied0.6%

Outcomes — Microsoft Corporation

DOL case-status mix.

Outcome breakdown: Certified 94.3%, Cert-withdrawn 4.9%, Withdrawn 0.7%, Denied 0.2%
Outcome breakdown
OutcomeShare
Certified94.3%
Cert-withdrawn4.9%
Withdrawn0.7%
Denied0.2%
Certified94.3%
Cert-withdrawn4.9%
Withdrawn0.7%
Denied0.2%

Yearly filing volume

Year-over-year H-1B demand for each sponsor.

ALTAIR ENGINEERING, INC.
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY201013
FY201117
FY201223
FY201327
FY201428
FY201533
FY201635
FY201744
FY201838
FY201957
FY202014
FY202121
FY202213
FY202322
FY202458
FY202542
FY20262
Microsoft Corporation
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY20104,407
FY20114,184
FY20124,005
FY20133,832
FY20143,674
FY20154,476
FY20164,919
FY20174,884
FY20185,457
FY20196,000
FY202051
FY2021110
FY2022150
FY20232,791
FY20249,492
FY20259,362
FY20265,118

Top 5 occupations — Microsoft Corporation

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Replace either sponsor above without losing the comparison. 2-way for now; 3+ comparison coming soon.