H1B Report
Side-by-side comparison

Deloitte Consulting LLP vs LUCID TECHNOLOGIES LLC

A direct H-1B sponsorship comparison built from the same DOL Labor Condition Application data that drives every page on H1B Report. Total filings, outcome rates, top occupations and yearly demand side-by-side.

Entity A
Deloitte Consulting LLP
PARank #4FEIN 06-1454513
Entity B
LUCID TECHNOLOGIES LLC
NJRank #FEIN 41-2126587

Key metrics

All percentages are share of total LCAs filed by each sponsor.

MetricDeloitte Consulting LLPLUCID TECHNOLOGIES LLC
Total filings80,813468
Certified %98.23%99.15%
Denied %1.09%0.64%
Withdrawn %0.61%0.21%
Cert-withdrawn %0.07%0.00%
Rank#4
Active yearsFY2010–FY2026FY2010–FY2026
Worksite statePANJ

Outcomes — Deloitte Consulting LLP

DOL case-status mix.

Outcome breakdown: Certified 98.2%, Cert-withdrawn 0.1%, Withdrawn 0.6%, Denied 1.1%
Outcome breakdown
OutcomeShare
Certified98.2%
Cert-withdrawn0.1%
Withdrawn0.6%
Denied1.1%
Certified98.2%
Cert-withdrawn0.1%
Withdrawn0.6%
Denied1.1%

Outcomes — LUCID TECHNOLOGIES LLC

DOL case-status mix.

Outcome breakdown: Certified 99.2%, Withdrawn 0.2%, Denied 0.6%
Outcome breakdown
OutcomeShare
Certified99.2%
Withdrawn0.2%
Denied0.6%
Certified99.2%
Withdrawn0.2%
Denied0.6%

Yearly filing volume

Year-over-year H-1B demand for each sponsor.

Deloitte Consulting LLP
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY20102,375
FY20113,610
FY20124,716
FY20136,082
FY20147,007
FY20157,572
FY20167,629
FY20177,147
FY201816,089
FY20197,754
FY202052
FY202135
FY202211
FY20231,134
FY20242,702
FY20254,286
FY20262,612
LUCID TECHNOLOGIES LLC
Time series: 17 points from FY2010 to FY2026
Time series
PeriodValue
FY20103
FY20115
FY201226
FY201316
FY201435
FY2015175
FY201671
FY201730
FY201831
FY201953
FY20202
FY20211
FY20222
FY20230
FY202411
FY20252
FY20265

Top 5 occupations — Deloitte Consulting LLP

Top 5 occupations — LUCID TECHNOLOGIES LLC

Swap an entity
Replace either sponsor above without losing the comparison. 2-way for now; 3+ comparison coming soon.